Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann

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Current library	Call number	Status	Date due	Barcode
Anna Centenary Library	621.38152 BOR (Browse shelf(Opens below))	Available		304305

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Previous	621.38152 BAR Proceedings of the 14th international conference on defects in semiconductors : Paris, France, August 18-22, 1986	621.38152 BER High speed CMOS design styles	621.38152 BHA Semiconductor Optoelectronic Devices	621.38152 BOR Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology	621.38152 BRE Introduction to semiconductor devices : for computing and telecommunications applications	621.38152 BRE Introduction to semiconductor devices for computing and telecommunications applications	621.38152 BUB Photoelectronic properties of semiconductors	Next

Includes bibliographical references and index

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