Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan (Record no. 590421)

MARC details
000 -LEADER
fixed length control field 00733nam a22002177a 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 251003b |||||||| |||| 00| 0 eng d
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 0819453692
Paper back/Hardbound pbk.
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.381531
Item number TAN
100 ## - MAIN ENTRY--AUTHOR NAME
Personal name Tanabe, Hiroyoshi
245 ## - TITLE STATEMENT
Title Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan
Statement of responsibility, etc / edited by Hiroyoshi Tanabe
250 ## - EDITION STATEMENT
Edition statement 1st ed.
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Bellingham
Name of publisher Spie
Year of publication c2004
300 ## - PHYSICAL DESCRIPTION
Number of Pages xiii, 990 p.
Other physical details : ill.
Dimensions ; 28 cm.
490 ## - SERIES STATEMENT
Series statement Proceedings of SPIE--the International Society for Optical Engineering
Volume number/sequential designation v. 5446
504 ## - BIBLIOGRAPHY, ETC. NOTE
Bibliography, etc Includes bibliographies and index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Integrated Circuits Masks
Topical Term Microlithography
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type Reference
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Shelving location Date acquired Full call number Accession Number Price effective from Koha item type
        Anna Centenary Library Anna Centenary Library 6TH FLOOR, B WING 11.12.2010 621.381531 TAN 423512 03.10.2025 Reference

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