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23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa (Record no. 590420)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00727nam a22001937a 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 251003b |||||||| |||| 00| 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| ISBN | 0819451436 |
| Paper back/Hardbound | pbk. |
| 100 ## - MAIN ENTRY--AUTHOR NAME | |
| Personal name | Kimmel, Kurt R. ; Staud, Wolfgang |
| 245 ## - TITLE STATEMENT | |
| Title | 23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa |
| Statement of responsibility, etc | / edited by Kurt R. Kimmel, Wolfgang Staud |
| 250 ## - EDITION STATEMENT | |
| Edition statement | 1st ed. |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication | Bellingham |
| Name of publisher | Spie |
| Year of publication | C2003 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Number of Pages | xvi, 1362 p. |
| Other physical details | : ill. some color |
| Dimensions | ; 28 cm. |
| 490 ## - SERIES STATEMENT | |
| Series statement | Proceedings of SPIE--the International Society for Optical Engineering |
| Volume number/sequential designation | v. 5256 |
| 504 ## - BIBLIOGRAPHY, ETC. NOTE | |
| Bibliography, etc | Includes bibliographies and index |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical Term | Integrated Circuits Masks |
| Topical Term | Microlithography |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Koha item type | Reference |
| Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Shelving location | Date acquired | Accession Number | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|
| Anna Centenary Library | Anna Centenary Library | 6TH FLOOR, B WING | 26.11.2010 | 276675 | 03.10.2025 | Reference |