Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA (Record no. 383849)

MARC details
000 -LEADER
fixed length control field 01064nam a2200265Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 191130s2008##################000#0#eng##
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9780819471093
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.381531 LEV
245 ## - TITLE STATEMENT
Title Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA
Statement of responsibility, etc Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA)
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Bellingham, WA
Name of publisher SPIE
Year of publication c2008
300 ## - PHYSICAL DESCRIPTION
Number of Pages 3 v. : ill. (some col. ) ; 28 cm
500 ## - GENERAL NOTE
General note Includes bibliographical references and author index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Integrated circuits - Masks - Congresses
Topical Term Manufacturing processes - Congresses
Topical Term Microlithography - Congresses
Topical Term X-ray lithography - Congresses
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Dusa, Mircea V
Personal name Levinson, Harry J
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element International SEMATECH, Society of Photo-optical Instrumentation Engineers
991 ## -
-- 367755

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