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000 -LEADER | |
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fixed length control field | 01097nam a2200229Ia 4500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 191130s2004##################000#0#eng## |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
ISBN | 9780819452894 |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
Classification number | 686.2325 STU |
245 ## - TITLE STATEMENT | |
Title | Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA |
Statement of responsibility, etc | John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH |
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
Place of publication | Bellingham, Wash |
Name of publisher | SPIE |
Year of publication | c2004 |
300 ## - PHYSICAL DESCRIPTION | |
Number of Pages | 2 v. (xxxviii, 1288 p.) : ill. ; 28 cm |
500 ## - GENERAL NOTE | |
General note | Includes bibliographical references and index |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical Term | Microlithography - Congresses |
Topical Term | Photoresists - Congresses |
700 ## - ADDED ENTRY--PERSONAL NAME | |
Personal name | Sturtevant, John L |
710 ## - ADDED ENTRY--CORPORATE NAME | |
Corporate name or jurisdiction name as entry element | International SEMATECH, Semiconductor Equipment and Materials International, Society of Photo-optical Instrumentation Engineers |
991 ## - | |
-- | 348631 |
Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Full call number | Accession Number | Price effective from | Koha item type |
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Anna Centenary Library | Anna Centenary Library | 17.10.2020 | 686.2325 STU | 276790 | 17.10.2020 | English Books | ||||
Anna Centenary Library | Anna Centenary Library | 17.10.2020 | 686.2325 STU | 276791 | 17.10.2020 | English Books |