Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA (Record no. 363610)

MARC details
000 -LEADER
fixed length control field 00647nam a2200205Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 191130s2000##################000#0#eng##
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9780819436177
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 686.2325 HOU
100 ## - MAIN ENTRY--AUTHOR NAME
Personal name Houlihan, Francis M
245 ## - TITLE STATEMENT
Title Advances in resist technology and processing XVII : 28 February-1 march, 2000, Santa Clara, USA
Statement of responsibility, etc Houlihan, Francis M
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Bellingham, WA
Name of publisher SPIE
Year of publication 2000
300 ## - PHYSICAL DESCRIPTION
Number of Pages xvii, 618 p. : ill. ; 29 cm
500 ## - GENERAL NOTE
General note Includes index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Microlithography
Topical Term Photoresists
991 ## -
-- 348429
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Full call number Accession Number Price effective from Koha item type
        Anna Centenary Library Anna Centenary Library 17.10.2020 686.2325 HOU 276788 17.10.2020 English Books
        Anna Centenary Library Anna Centenary Library 17.10.2020 686.2325 HOU 276789 17.10.2020 English Books

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