Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States (Record no. 363606)

MARC details
000 -LEADER
fixed length control field 00928nam a2200241Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 191130s2010##################000#0#eng##
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9780819480538
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.381531 ALL
245 ## - TITLE STATEMENT
Title Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States
Statement of responsibility, etc Robert D. Allen, Mark H. Somervell, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Bellingham, Wash
Name of publisher SPIE
Year of publication 2010
300 ## - PHYSICAL DESCRIPTION
Number of Pages 2 v. (various pagings) : ill. ; 28 cm
500 ## - GENERAL NOTE
General note Includes bibliographical references
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Microlithography - Congresses
Topical Term Photoresists - Congresses
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Allen, Robert D
Personal name Somervell, Mark Howell
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SPIE (Society)
991 ## -
-- 371113
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Full call number Accession Number Price effective from Koha item type
        Anna Centenary Library Anna Centenary Library 17.10.2020 621.381531 ALL 276821 17.10.2020 English Books
        Anna Centenary Library Anna Centenary Library 17.10.2020 621.381531 ALL 276822 17.10.2020 English Books

Find us on the map

Powered by Koha