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000 -LEADER | |
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fixed length control field | 00928nam a2200241Ia 4500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 191130s2010##################000#0#eng## |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
ISBN | 9780819480538 |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
Classification number | 621.381531 ALL |
245 ## - TITLE STATEMENT | |
Title | Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States |
Statement of responsibility, etc | Robert D. Allen, Mark H. Somervell, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) |
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
Place of publication | Bellingham, Wash |
Name of publisher | SPIE |
Year of publication | 2010 |
300 ## - PHYSICAL DESCRIPTION | |
Number of Pages | 2 v. (various pagings) : ill. ; 28 cm |
500 ## - GENERAL NOTE | |
General note | Includes bibliographical references |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical Term | Microlithography - Congresses |
Topical Term | Photoresists - Congresses |
700 ## - ADDED ENTRY--PERSONAL NAME | |
Personal name | Allen, Robert D |
Personal name | Somervell, Mark Howell |
710 ## - ADDED ENTRY--CORPORATE NAME | |
Corporate name or jurisdiction name as entry element | SPIE (Society) |
991 ## - | |
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Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Full call number | Accession Number | Price effective from | Koha item type |
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Anna Centenary Library | Anna Centenary Library | 17.10.2020 | 621.381531 ALL | 276821 | 17.10.2020 | English Books | ||||
Anna Centenary Library | Anna Centenary Library | 17.10.2020 | 621.381531 ALL | 276822 | 17.10.2020 | English Books |