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Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA (Record no. 35829)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01216nam a2200241Ia 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 191130s2006##################000#0#eng## |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780819464446 |
| 022 ## - INTERNATIONAL STANDARD SERIAL NUMBER | |
| International Standard Serial Number | 2007271488 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | ACL |
| Transcribing agency | ACL |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 MAR |
| 245 ## - TITLE STATEMENT | |
| Title | Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA |
| Statement of responsibility, etc. | Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Bellingham, WA |
| Name of publisher, distributor, etc. | SPIE |
| Date of publication, distribution, etc. | c2006 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | (various pagings) : ill. (some col.) ; 28 cm |
| 500 ## - GENERAL NOTE | |
| General note | Includes bibliographical references and index |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Integrated circuits - Masks - Congresses |
| Topical term or geographic name entry element | Microlithography - Congresses |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Martin, Patrick M |
| Personal name | Naber, Robert J |
| 710 ## - ADDED ENTRY--CORPORATE NAME | |
| Corporate name or jurisdiction name as entry element | BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Symposium on Photomask Technology (26th : 2006 : Monterey, Calif.) |
| 990 ## - EQUIVALENCES OR CROSS-REFERENCES [LOCAL, CANADA] | |
| Link information for 9XX fields | 020a198eac10000c406865cccd0f24a9 |
| 991 ## - | |
| -- | 261847 |
| Withdrawn status | Lost status | Materials specified (bound volume or other part) | Damaged status | Not for loan | Home library | Current library | Date acquired | Total Checkouts | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| pbk | Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.381531 MAR | 424520 | 09.10.2020 | 09.10.2020 | English Books | |||||
| pbk | Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.381531 MAR | 424521 | 09.10.2020 | 09.10.2020 | English Books |