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Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan (Record no. 35826)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01057nam a2200265Ia 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 191130s2009##################000#0#eng## |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780819476562 |
| 022 ## - INTERNATIONAL STANDARD SERIAL NUMBER | |
| International Standard Serial Number | 2010287868 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | ACL |
| Transcribing agency | ACL |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 HOS |
| 245 ## - TITLE STATEMENT | |
| Title | Photomask and next-generation lithography mask technology XVI : 8-10 April 2009, Yokohama, Japan |
| Statement of responsibility, etc. | Kunihiro Hosono, editor ; sponsored by PMJ Photomask Japan, BACUS [and] SPIE |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Bellingham, WA |
| Name of publisher, distributor, etc. | SPIE |
| Date of publication, distribution, etc. | c2009 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | 1 v. (various pagings) : ill. ; 28 cm |
| 500 ## - GENERAL NOTE | |
| General note | Includes bibliographical references and author index |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Integrated circuits - Masks - Congresses |
| Topical term or geographic name entry element | Masks (Electronics) - Congresses |
| Topical term or geographic name entry element | Microlithography - Congresses |
| Topical term or geographic name entry element | Optoelectronic devices - Design and construction - Congresses |
| Topical term or geographic name entry element | X-ray lithography - Congresses |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Hosono, Kunihiro |
| 710 ## - ADDED ENTRY--CORPORATE NAME | |
| Corporate name or jurisdiction name as entry element | BACUS (Technical group), Photomask Japan, SPIE (Society) |
| 990 ## - EQUIVALENCES OR CROSS-REFERENCES [LOCAL, CANADA] | |
| Link information for 9XX fields | a78c536fac10000c2c512c9a2649301e |
| 991 ## - | |
| -- | 342511 |
| Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Total Checkouts | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.381531 HOS | 423566 | 09.10.2020 | 09.10.2020 | Books |