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Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan (Record no. 35825)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01531nam a2200265Ia 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 191130s2005##################000#0#eng## |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780819458537 |
| 022 ## - INTERNATIONAL STANDARD SERIAL NUMBER | |
| International Standard Serial Number | 2005284357 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | ACL |
| Transcribing agency | ACL |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.3815 KOM |
| 245 ## - TITLE STATEMENT | |
| Title | Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan |
| Statement of responsibility, etc. | Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Bellingham, WA |
| Name of publisher, distributor, etc. | SPIE |
| Date of publication, distribution, etc. | c2005 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | 2 v. (xli, 1048 p.) : ill. ; 28 cm |
| 500 ## - GENERAL NOTE | |
| General note | Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Integrated circuits - Masks - Congresses |
| Topical term or geographic name entry element | Masks (Electronics) - Congresses |
| Topical term or geographic name entry element | Microlithography - Congresses |
| Topical term or geographic name entry element | Optoelectronic devices - Design and construction - Congresses |
| Topical term or geographic name entry element | X-ray lithography - Congresses |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Komuro, Masanori |
| 710 ## - ADDED ENTRY--CORPORATE NAME | |
| Corporate name or jurisdiction name as entry element | BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Society of Photo-optical Instrumentation Engineers |
| 990 ## - EQUIVALENCES OR CROSS-REFERENCES [LOCAL, CANADA] | |
| Link information for 9XX fields | df0baf9aac10000c60b974acf2c51954 |
| 991 ## - | |
| -- | 371149 |
| Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Total Checkouts | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.3815 KOM | 278100 | 09.10.2020 | 09.10.2020 | Books | |||||
| Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.3815 KOM | 278101 | 09.10.2020 | 09.10.2020 | Books |