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Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan (Record no. 35824)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01654nam a2200265Ia 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 191130s2004##################000#0#eng## |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780819453693 |
| 022 ## - INTERNATIONAL STANDARD SERIAL NUMBER | |
| International Standard Serial Number | 2005298703 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | ACL |
| Transcribing agency | ACL |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 TAN |
| 245 ## - TITLE STATEMENT | |
| Title | Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan |
| Statement of responsibility, etc. | Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Bellingham, WA |
| Name of publisher, distributor, etc. | SPIE |
| Date of publication, distribution, etc. | c2004 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | 2 v. (xxxiii, 984 p.) : ill. ; 28 cm |
| 500 ## - GENERAL NOTE | |
| General note | Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Integrated circuits - Masks - Congresses |
| Topical term or geographic name entry element | Masks (Electronics) - Congresses |
| Topical term or geographic name entry element | Microlithography - Congresses |
| Topical term or geographic name entry element | Optoelectronic devices - Design and construction - Congresses |
| Topical term or geographic name entry element | X-ray lithography - Congresses |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Tanabe, Hiroyoshi |
| 710 ## - ADDED ENTRY--CORPORATE NAME | |
| Corporate name or jurisdiction name as entry element | BACUS (Technical group), Institute of Electrical and Electronics Engineers. Japan Section, Photomask Japan, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers |
| 990 ## - EQUIVALENCES OR CROSS-REFERENCES [LOCAL, CANADA] | |
| Link information for 9XX fields | b5df18d3ac10000c647cf1d97eb6121c |
| 991 ## - | |
| -- | 348962 |
| Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Total Checkouts | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.381531 TAN | 423511 | 09.10.2020 | 09.10.2020 | Books | |||||
| Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.381531 TAN | 423517 | 09.10.2020 | 09.10.2020 | Books |