Search the Library Catalogue
Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan (Record no. 35820)
[ view plain ]
| 000 -LEADER | |
|---|---|
| fixed length control field | 01602nam a2200265Ia 4500 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 191130s2001##################000#0#eng## |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9780819445179 |
| 022 ## - INTERNATIONAL STANDARD SERIAL NUMBER | |
| International Standard Serial Number | 2004272510 |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | ACL |
| Transcribing agency | ACL |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 621.381531 KAW |
| 245 ## - TITLE STATEMENT | |
| Title | Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan |
| Statement of responsibility, etc. | Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Bellingham, WA |
| Name of publisher, distributor, etc. | SPIE |
| Date of publication, distribution, etc. | c2001 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | xxx, 918 p. : ill. ; 28 cm |
| 500 ## - GENERAL NOTE | |
| General note | Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Integrated circuits - Masks - Congresses |
| Topical term or geographic name entry element | Masks (Electronics) - Congresses |
| Topical term or geographic name entry element | Microlithography - Congresses |
| Topical term or geographic name entry element | Optoelectronic devices - Design and construction - Congresses |
| Topical term or geographic name entry element | X-ray lithography - Congresses |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Kawahira, Hiroichi |
| 710 ## - ADDED ENTRY--CORPORATE NAME | |
| Corporate name or jurisdiction name as entry element | BACUS (Technical group), Ōyō Butsuri Gakkai, Photomask Japan, Photomask Japan 2002 (2002 : Yokohama, Japan), Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers |
| 990 ## - EQUIVALENCES OR CROSS-REFERENCES [LOCAL, CANADA] | |
| Link information for 9XX fields | d98bdfc9ac10000c1d75a066f2984d0f |
| 991 ## - | |
| -- | 367873 |
| Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Total Checkouts | Full call number | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Anna Centenary Library | Anna Centenary Library | 09.10.2020 | 621.381531 KAW | 278069 | 09.10.2020 | 09.10.2020 | Books |