Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States (Record no. 273582)

MARC details
000 -LEADER
fixed length control field 01055nam a2200253Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 191130s2009##################000#0#eng##
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9780819475251
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.381548 ALL
245 ## - TITLE STATEMENT
Title Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States
Statement of responsibility, etc John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Bellingham, WA
Name of publisher SPIE
Year of publication 2009
300 ## - PHYSICAL DESCRIPTION
Number of Pages 2 v. : ill. ; 28 cm
500 ## - GENERAL NOTE
General note Includes bibliographical references and index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Integrated circuits - Inspection - Congresses
Topical Term Integrated circuits - Measurement - Congresses
Topical Term Microlithography - Congresses
Topical Term Process control - Congresses
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Allgair, John A
Personal name Raymond, Christopher J
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element International SEMATECH, SPIE (Society)
991 ## -
-- 342505
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Full call number Accession Number Price effective from Koha item type
        Anna Centenary Library Anna Centenary Library 13.10.2020 621.381548 ALL 424030 13.10.2020 English Books
        Anna Centenary Library Anna Centenary Library 13.10.2020 621.381548 ALL 424031 13.10.2020 English Books

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