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000 -LEADER | |
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fixed length control field | 01044nam a2200229Ia 4500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 191130s2007##################000#0#eng## |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
ISBN | 9780819466389 |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
Classification number | 621.381 DUP |
245 ## - TITLE STATEMENT | |
Title | Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA |
Statement of responsibility, etc | Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH |
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
Place of publication | Bellingham, Wash |
Name of publisher | SPIE |
Year of publication | c2007 |
300 ## - PHYSICAL DESCRIPTION | |
Number of Pages | 2 v. : ill. ; 28 cm |
500 ## - GENERAL NOTE | |
General note | Previous conference proceedings entitled: Advances in resist technology and processing. Includes bibliographical references and author index |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical Term | Microlithography - Congresses |
Topical Term | Photoresists - Congresses |
700 ## - ADDED ENTRY--PERSONAL NAME | |
Personal name | Lin, Qinghuang |
710 ## - ADDED ENTRY--CORPORATE NAME | |
Corporate name or jurisdiction name as entry element | SEMATECH (Organization), Society of Photo-optical Instrumentation Engineers |
991 ## - | |
-- | 376202 |
Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Full call number | Accession Number | Price effective from | Koha item type |
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Anna Centenary Library | Anna Centenary Library | 13.10.2020 | 621.381 DUP | 276704 | 13.10.2020 | English Books | ||||
Anna Centenary Library | Anna Centenary Library | 13.10.2020 | 621.381 DUP | 276705 | 13.10.2020 | English Books |