Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA (Record no. 240693)

MARC details
000 -LEADER
fixed length control field 01044nam a2200229Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 191130s2007##################000#0#eng##
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9780819466389
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.381 DUP
245 ## - TITLE STATEMENT
Title Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA
Statement of responsibility, etc Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Bellingham, Wash
Name of publisher SPIE
Year of publication c2007
300 ## - PHYSICAL DESCRIPTION
Number of Pages 2 v. : ill. ; 28 cm
500 ## - GENERAL NOTE
General note Previous conference proceedings entitled: Advances in resist technology and processing. Includes bibliographical references and author index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Microlithography - Congresses
Topical Term Photoresists - Congresses
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Lin, Qinghuang
710 ## - ADDED ENTRY--CORPORATE NAME
Corporate name or jurisdiction name as entry element SEMATECH (Organization), Society of Photo-optical Instrumentation Engineers
991 ## -
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Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Full call number Accession Number Price effective from Koha item type
        Anna Centenary Library Anna Centenary Library 13.10.2020 621.381 DUP 276704 13.10.2020 English Books
        Anna Centenary Library Anna Centenary Library 13.10.2020 621.381 DUP 276705 13.10.2020 English Books

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