Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology (Record no. 127352)

MARC details
000 -LEADER
fixed length control field 01049nam a2200265Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 191130s2002##################000#0#eng##
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
ISBN 9781402071935
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.38152 BOR
100 ## - MAIN ENTRY--AUTHOR NAME
Personal name Borst, Christopher L
245 ## - TITLE STATEMENT
Title Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses : fundamental mechanisms and application to IC interconnect technology
Statement of responsibility, etc by Christopher L. Borst, William N. Gill, Ronald J. Gutmann
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Deventer, The Netherlands ; Boston, MA
Name of publisher Kluwer Academic Publishers
Year of publication 2002
300 ## - PHYSICAL DESCRIPTION
Number of Pages xiv, 229 p. : ill. ; 25 cm
500 ## - GENERAL NOTE
General note Includes bibliographical references and index
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical Term Chemical mechanical planarization
Topical Term Grinding and polishing
Topical Term Interconnects (Integrated circuit technology)
Topical Term Semiconductors - Polishing
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Gill, William N
Personal name Gutmann, Ronald J
991 ## -
-- 149096
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Full call number Accession Number Price effective from Koha item type
        Anna Centenary Library Anna Centenary Library 12.10.2020 621.38152 BOR 304305 12.10.2020 English Books

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