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Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA

Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA Daniel J. Herr, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH - Bellingham, WA SPIE c2003 - 2 v. (xxvii, 1248 p.) : ill. (some col.) ; 28 cm

Includes bibliographical references and author index

ISBN: 9780819448439

ISSN: 2004296373

Subjects--Topical Terms:
Integrated circuits - Inspection - Congresses
Integrated circuits - Measurement - Congresses
Microlithography - Congresses
Process control - Congresses

Dewey Class. No.: 621.381531 HER

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Metrology, inspection, and process control for microlithography XVII : 24-27 February, 2003, Santa Clara, California, USA

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