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Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California Bhanwar Singh, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH - Bellingham, WA SPIE c1998 - xv, 744 p. : ill. ; 28 cm

Includes bibliographical references and index

ISBN: 9780819427779

ISSN: 98226775

Subjects--Topical Terms:
Integrated circuits - Inspection - Congresses
Integrated circuits - Measurement - Congresses
Microlithography - Congresses
Process control - Congresses

Dewey Class. No.: 621.381531 SIN

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Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, Santa Clara, California

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