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23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa

Kimmel, Kurt R. ; Staud, Wolfgang

23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa / edited by Kurt R. Kimmel, Wolfgang Staud - 1st ed. - Bellingham Spie c2003 - xix, 700 p. : ill. ; 29 cm. - Proceedings of SPIE--the International Society for Optical Engineering v. 5256 .

Includes bibliographies and index

ISBN: 0819451436

Subjects--Topical Terms:
Integrated Circuits Masks
Microlithography

Dewey Class. No.: 621.381531 / KIM

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23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa

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