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Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan

Tanabe, Hiroyoshi

Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan / edited by Hiroyoshi Tanabe - 1st ed. - Bellingham Spie c2004 - xiii, 990 p. : ill. ; 28 cm. - Proceedings of SPIE--the International Society for Optical Engineering v. 5446 .

Includes bibliographies and index

ISBN: 0819453692

Subjects--Topical Terms:
Integrated Circuits Masks
Microlithography

Dewey Class. No.: 621.381531 / TAN

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Photomask And Next-generation Lithography Mask Technology Xi : 14-16 April, 2004, Yokohama, Japan

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