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23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa
Kimmel, Kurt R. ; Staud, Wolfgang
23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa / edited by Kurt R. Kimmel, Wolfgang Staud - 1st ed. - Bellingham Spie C2003 - xvi, 1362 p. : ill. some color ; 28 cm. - Proceedings of SPIE--the International Society for Optical Engineering v. 5256 .
Includes bibliographies and index
0819451436
Integrated Circuits Masks
Microlithography
23rd Annual Bacus Symposium On Photomask Technology : 9-12 September, 2003, Monterey, California, Usa / edited by Kurt R. Kimmel, Wolfgang Staud - 1st ed. - Bellingham Spie C2003 - xvi, 1362 p. : ill. some color ; 28 cm. - Proceedings of SPIE--the International Society for Optical Engineering v. 5256 .
Includes bibliographies and index
0819451436
Integrated Circuits Masks
Microlithography