Pulsed and pulsed bias sputtering : principles and applications

Barnat, Edward V

Pulsed and pulsed bias sputtering : principles and applications by Edward V. Barnat, Toh-Ming Lu - Boston Kluwer Academic 2003 - x, 155 p. : ill. ; 24 cm

Includes bibliographical references and index

9781402075438

2003054987


Cathode sputtering (Plating process)
Thin films

621.38152 BAR

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