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Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA

Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA John L. Sturtevant, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH - Bellingham, Wash SPIE c2004 - 2 v. (xxxviii, 1288 p.) : ill. ; 28 cm

Includes bibliographical references and index

ISBN: 9780819452894

ISSN: 2004303191

Subjects--Topical Terms:
Microlithography - Congresses
Photoresists - Congresses

Dewey Class. No.: 686.2325 STU

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Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA

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