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Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States

Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States Robert D. Allen, Mark H. Somervell, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States) - Bellingham, Wash SPIE 2010 - 2 v. (various pagings) : ill. ; 28 cm

Includes bibliographical references

ISBN: 9780819480538

ISSN: 2010459431

Subjects--Topical Terms:
Microlithography - Congresses
Photoresists - Congresses

Dewey Class. No.: 621.381531 ALL

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Advances in resist materials and processing technology XXVII : 22-24 February 2010, San Jose, California, United States

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