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Advanced processes for 193-nm immersion lithography

Wei, Yayi

Advanced processes for 193-nm immersion lithography Yayi Wei, Robert L. Brainard - Bellingham, Wash SPIE 2009 - xix, 315 p. : ill. ; 26 cm

Includes bibliographical references and index

ISBN: 9780819475572

ISSN: 2008050743

Subjects--Topical Terms:
Immersion lithography
Integrated circuits - Design and construction
Semiconductors - Etching

Dewey Class. No.: 621.381531 WEI

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Advanced processes for 193-nm immersion lithography

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