Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA
Photomask technology 2006 : 19-22 September, 2006, Monterey, California, USA
Patrick M. Martin, Robert J. Naber, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering
- Bellingham, WA SPIE c2006
- (various pagings) : ill. (some col.) ; 28 cm