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Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan

Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan Masanori Komuro, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Japan Society of Applied Physics ... (et al.) ; supported by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering - Bellingham, WA SPIE c2005 - 2 v. (xli, 1048 p.) : ill. ; 28 cm

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

ISBN: 9780819458537

ISSN: 2005284357

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Masks (Electronics) - Congresses
Microlithography - Congresses
Optoelectronic devices - Design and construction - Congresses
X-ray lithography - Congresses

Dewey Class. No.: 621.3815 KOM

Photomask and next-generation lithography mask technology XII : 13-15 April, 2005, Yokohama, Japan

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