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Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan

Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan Hiroichi Kawahira, editor ; sponsored by PMJ--Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, the Japan Society of Applied Physics ... [et al.] ; cooperating organization for technical exhibit, SEMI Japan ; supported by Yokohama City ; published by SPIE--the International Society for Optical Engineering - Bellingham, WA SPIE c2001 - xxx, 918 p. : ill. ; 28 cm

Some earlier proceedings have title: Photomask and X-ray mask technology. Includes bibliographical references and author index

ISBN: 9780819445179

ISSN: 2004272510

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Masks (Electronics) - Congresses
Microlithography - Congresses
Optoelectronic devices - Design and construction - Congresses
X-ray lithography - Congresses

Dewey Class. No.: 621.381531 KAW

Photomask and next-generation lithography mask technology IX : 23-25 April, 2002, Yokohama, Japan

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