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Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA

Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE - Bellingham, WA SPIE c2007 - 3 v. : ill. (some col.) ; 28 cm

Some earlier conferences have title: Symposium on Photomask Technology. Includes bibliographical references and author index

ISBN: 9780819468871

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Microlithography - Congresses

Dewey Class. No.: 621.36 NAB.6730

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Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA

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