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Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA

Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA Harry J. Levinson, Mircea V. Dusa, editors ; sponsored and published by SPIE ; cooperating organization, SEMATECH (USA) - Bellingham, WA SPIE c2008 - 3 v. : ill. (some col. ) ; 28 cm

Includes bibliographical references and author index

ISBN: 9780819471093

ISSN: 2010287642

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Manufacturing processes - Congresses
Microlithography - Congresses
X-ray lithography - Congresses

Dewey Class. No.: 621.381531 LEV

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Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA

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