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Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA

Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc - Bellingham, WA SPIE c2007 - 3 v. : ill. (some col. ) ; 28 cm

Includes bibliographical references and author index

ISBN: 9780819466396

ISSN: 2010459315

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Manufacturing processes - Congresses
Microlithography - Congresses
X-ray lithography - Congresses

Dewey Class. No.: 621.381531 FLA.1

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Optical microlithography XX : 27 February - 2 march 2007, San Jose, California, USA

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