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Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA

Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA Bruce W. Smith, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH - Bellingham, WA SPIE c2005 - 3 v. : ill. (some col. ) ; 28 cm

Includes bibliographical references and author index

ISBN: 9780819457349

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Manufacturing processes - Congresses
Microlithography - Congresses
X-ray lithography - Congresses

Dewey Class. No.: 621.381531 SMI

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Optical microlithography XVIII : 1-4 march, 2005, San Jose, California, USA

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