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Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA

Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA Bruce W. Smith, chair/editor ; sponsored... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH - Bellingham, WA SPIE 2004 - 3 v. (xxiii, 2008 p. ) : ill. (some col. ) ; 28 cm.

Includes bibliographical references and index

ISBN: 9780819452900

Subjects--Topical Terms:
Integrated circuits - Masks - Congresses
Manufacturing processes - Congresses
Microlithography - Congresses
X-ray lithography - Congresses

Dewey Class. No.: 621.366 SMI

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Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA

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