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Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States

Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States Frank M. Schellenberg, Bruno M. La Fontaine, editors, ; sponsored by SPIE ; cooperating organization, SEMATECH Inc - Bellingham, Wash SPIE c2009- - 2 v. (various pagings) : ill. ; 28 cm

Previous conference proceedings entitled: Emerging lithographic technologies. Includes bibliographical references and author index

ISBN: 9780819475244

ISSN: 2010455661

Subjects--Topical Terms:
Extreme ultraviolet lithography - Congresses
Lithography, Electron beam - Congresses
Masks (Electronics) - Congresses
Microlithography - Industrial applications - Congresses

Dewey Class. No.: 621.381531 SCH

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Alternative lithographic technologies : 24-26 February 2009, San Jose, California, United States

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