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Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA

Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH - Bellingham, Wash SPIE c2007 - 2 v. : ill. ; 28 cm

Previous conference proceedings entitled: Advances in resist technology and processing. Includes bibliographical references and author index

ISBN: 9780819466389

ISSN: 2009284505

Subjects--Topical Terms:
Microlithography - Congresses
Photoresists - Congresses

Dewey Class. No.: 621.381 DUP

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Advances in resist materials and processing technology XXIV : 26-28 February, 2007, San Jose, California, USA

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