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Lithography for semiconductor manufacturing II : 30 may-1 June, 2001, Edinburgh, UK

Lithography for semiconductor manufacturing II : 30 may-1 June, 2001, Edinburgh, UK Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK) - Bellingham, WA SPIE c2001 - vii, 422 p. : ill. (some col.) ; 28 cm

Includes bibliographical references and index

ISBN: 9780819441058

ISSN: 2003268042

Subjects--Topical Terms:
Integrated circuits - Design and construction - Congresses
Integrated circuits - Very large scale integration - Congresses
Microlithography - Congresses
Semiconductors - Etching - Congresses

Dewey Class. No.: 670 MAC

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Lithography for semiconductor manufacturing II : 30 may-1 June, 2001, Edinburgh, UK

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