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In-line characterization, yield reliability, and failure analyses in microelectronic manufacturing : 19-21 May, 1999, Edinburgh, Scotland
In-line characterization, yield reliability, and failure analyses in microelectronic manufacturing : 19-21 May, 1999, Edinburgh, Scotland
Kostas Amberiadis ... [et al.], chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering, [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers
- Bellingham, WA SPIE c1999
- viii, 344 p. : ill. ; 28 cm
Includes bibliographical references and index
9780819432230
266407
Integrated circuits - Very large scale integration - Design and construction - Congresses
Manufacturing processes - Congresses
Microelectronics - Materials - Congresses
Semiconductors - Design and construction - Congresses
621.3815 AMB
Includes bibliographical references and index
9780819432230
266407
Integrated circuits - Very large scale integration - Design and construction - Congresses
Manufacturing processes - Congresses
Microelectronics - Materials - Congresses
Semiconductors - Design and construction - Congresses
621.3815 AMB