Normal view MARC view ISBD view

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA Lars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH - Bellingham, Wash SPIE c2005 - xxxv, 438 p. : ill. (some col.) ; 28 cm

Includes bibliographical references and author index

ISBN: 9780819457363

ISSN: 2006272389

Subjects--Topical Terms:
Integrated circuits - Defects - Analysis - Congresses
Integrated circuits - Design and construction - Congresses
Microelectronics industry - Quality control - Congresses
Quality control - Congresses
Semiconductor wafers - Defects - Analysis - Congresses
Semiconductors - Design and construction - Congresses

Dewey Class. No.: 621.381 LIE

Print
Save record
BIBTEX Dublin Core MARCXML MARC (non-Unicode/MARC-8) MARC (Unicode/UTF-8) MARC (Unicode/UTF-8, Standard) MODS (XML) RIS ISBD
More searches

Search for this title in:
Other Libraries (WorldCat) Other Databases (Google Scholar) Online Stores (Bookfinder.com) Open Library (openlibrary.org)

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

Find us on the map