Normal view MARC view ISBD view

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA Lars W. Liebmann, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH - Bellingham, Wash SPIE c2004 - xxviii, 302 p. : ill., ports. ; 28 cm

Includes bibliographical references and index

ISBN: 9780819452924

ISSN: 2004303081

Subjects--Topical Terms:
Integrated circuits - Defects - Analysis - Congresses
Integrated circuits - Design and construction - Congresses
Microelectronics industry - Quality control - Congresses
Quality control - Congresses
Semiconductor wafers - Defects - Analysis - Congresses
Semiconductors - Design and construction - Congresses

Dewey Class. No.: 621.381 LIE

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

Find us on the map