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Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA Kenneth W. Tobin, Jr., chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] International SEMATECH - Bellingham, Wash SPIE c2004 - xxx, 248 p. : ill. ; 28 cm

Includes bibliographical references and index

ISBN: 9780819452917

ISSN: 2004303114

Subjects--Topical Terms:
Intelligent control systems - Mathematical models - Congresses
Manufacturing processes - Automatic control - Congresses
Manufacturing processes - Mathematical models - Congresses
Process control - Mathematical models - Congresses

Dewey Class. No.: 660.2815 TOB

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Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

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