Chemical vapour deposition : precursors, processes and applications

Chemical vapour deposition : precursors, processes and applications edited by Anthony C. Jones, Michael L. Hitchman - Cambridge Royal Society of Chemistry c2009 - xv, 582 p. : ill., plans ; 26 cm

Includes bibliographical references and index

9780854044658

2009419379


Chemical vapor deposition

671.735 JON

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