Metrology, inspection, and process control for microlithography XXIII : 23-26 February 2009, San Jose, California, United States John A. Allgair, Christopher J. Raymond, editors ; sponsored by SPIE ; cooperating organization, SEMATECH Inc. (United States)

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Publication details: Bellingham, WA SPIE 2009Description: 2 v. : ill. ; 28 cmISBN:

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Holdings
Item type	Current library	Call number	Materials specified	Status	Barcode
English Books	Anna Centenary Library	621.381548 ALL (Browse shelf(Opens below))	pbk	Available	424030
English Books	Anna Centenary Library	621.381548 ALL (Browse shelf(Opens below))	pbk	Available	424031

Includes bibliographical references and index

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